Silicon doping

Our offer

Neutron Transmutation Doped (NTD) silicon is produced for the semiconductor industry in the SIDONIE (Silicon Doping by Neutron Irradiation Experiment) facility, which is designed to continuously rotate and traverse the silicon through the neutron flux. These combined movements produce exceptional dopant homogeneity in batches of silicon measuring 4 and 5 inches in diameter by up to 750 mm in length.

The construction of POSEIDON (POol Side Equipment for Irradiation and DOping of silicon by Neutrons) in 2008, a new NTD silicon Pool Side Facility, will increase BR2's NTD silicon capability and meet today's increasing demand for irradiation of 6 and 8 inches diameter silicon ingots.

A reliable and qualitative supply of NTD-silicon is provided to the customers in accordance with a quality system that has been certified to the requirements of "EN ISO 9001 : 2000". This new Quality System Certificate has been obtained in December 2006 for the "Production of Neutron Transmutation Doped (NTD) Silicon" in the BR2 reactor.

Our equipment

BR2 - Belgian Reactor 2
The SIDONIE irradiation facility
The POSEIDON irradiation facility

Contact: Ponsard Bernard , Project Manager 'Radioisotopes and NTD-Silicon'